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Parameters of the tip arrays covered by low work function layers

机译:低功函数图层覆盖的尖端阵列的参数

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Electron field emission from silicon tip arrays is investigated. Coating of the emitter surface with a suitable material is an attractive means to improve emission properties of tip arrays. The aim of our study is to enhance emission efficiency. To this end, different silicon tip array structures, namely (i) structures with a porous silicon layer on top of the tips, (ii) structures covered by carbon films, (iii) silicon tips implanted with hydrogen, (iv) Cs-enriched Si tips were prepared and investigated. For comparison and characterization purposes different structure parameters defining emission efficiency, namely the emitter work function, the field enhancement factor and the area factor were determined.
机译:研究了来自硅尖端阵列的电子场发射。用合适材料涂覆发射极表面是一种有吸引力的方法,以改善尖端阵列的排放性能。我们研究的目的是提高排放效率。在该端,不同的硅尖端阵列结构,即(i)在尖端顶部的多孔硅层的结构,(ii)由碳膜覆盖的结构,(iii)植入氢气的硅提示,(iv)富含Cs-cs-cs-cscips编写并调查了SI提示。为了比较和表征目的,不同的结构参数定义发射效率,即确定发射器功函数,现场增强因子和面积因子。

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