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1khz repetition rate pulsed power for an intense ion beam diode

机译:用于强孔离子束二极管的1kHz重复率脉冲功率

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A magnetically insulated ion beam diode with a gas-break down plasma anode/sup 1/ is being developed as a possible high repetition rate intense ion beam source./sup 2,3/ This paper discusses the design and operation of the five independent pulsed power systems required to produce /spl les/ 200 kV, 40 kA, 100 ns power pulses at up to 1kHz (burst mode) repetition rates. The first part of this paper will briefly describe the diode, followed by an overview of the pulsed power systems. The bulk of the paper will then describe these systems in detail, concentrating on the use of electrolytic capacitors in high current repetitive pulse storage banks, the use of SCR series stacks for high voltage switching, and the design and operation of two solid state pulsers.
机译:磁绝缘离子束二极管具有燃气分解等离子体阳极/ SUP 1 /正在开发作为可能的高重复速率强度离子束源。/本文讨论了五个独立脉冲的设计和操作生产/ SPL LES / 200 kV,40 kA,100ns功率脉冲所需的电源系统,最多1kHz(突发模式)重复率。本文的第一部分将简要描述二极管,然后概述脉冲电力系统。本文的大部分将详细描述这些系统,专注于在高电流重复脉冲存储体中使用电解电容,使用SCR系列堆叠进行高压切换,以及两个固态脉冲的设计和操作。

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