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The local energy level of polyimide

机译:聚酰亚胺的局部能量水平

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Photoconduction and photoabsorption experiments on polyimide films with different imidities and crosslinking densities are described. Initially the energy gap was found to be larger than 10.35 eV, and the thresholds of photoinjection for gold and aluminium electrodes were 1.65 eV and 0.9 eV, respectively. By changing the molecular morphology of the sample, changing the polarity of the radiated electrode, and precharging the sample under high voltage, it was shown that there are many kinds of local energy levels with different energy levels in the forbidden band. Local levels were found to be closely related to the chemical and physical morphology of the material, among which the level originating from the imide group is the deepest level and acts as an electron donor. The density of the remaining levels decreases with the increase of imidity and crosslinking density.
机译:描述了具有不同模拟性和交联密度的聚酰亚胺膜上的光电电影程和光吸收实验。最初发现能量隙大于10.35eV,金和铝电极的光素阈值分别为1.65eV和0.9eV。通过改变样品的分子形貌,改变辐射电极的极性,并在高电压下对样品进行预充电,示出有许多类型的局部能级,禁止带有不同的能量水平。发现局部水平与材料的化学和物理形态密切相关,其中源自酰亚胺组的水平是最深的水平,并充当电子给体。随着含量和交联密度的增加,剩余水平的密度降低。

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