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Design of Miniaturized On-chip SIW Cavity Filter and Diplexer in 65nm CMOS Process

机译:65NM CMOS工艺中小型化片上腔腔体滤波器和双工器的设计

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A miniaturized on-chip substrate integrated waveguide (SIW) bandpass filter (BPF) and diplexer are designed in a 65nm CMOS process. The miniaturization of 42% is achieved by carving slots in the top layer of the SIW cavity. The designed two pole bandpass filter has a simulated 3 dB bandwidth of 11.1% around 70 GHz, while the diplexer has 3-dB bandwidths of 15.3% GHz and 14.86% around 71 and 90.9 GHz, respectively. Moreover, the isolation between two output ports of the diplexer is greater than -27.3 dB.
机译:小型化的片上基板集成波导(SIW)带通滤波器(BPF)和双工器设计成65nm CMOS工艺。通过雕刻在SiW腔的顶层中的槽来实现42%的小型化。设计的两极带通滤波器的模拟3 dB带宽为11.1%左右70 GHz,而双工器分别具有15.3%GHz的3-dB带宽,分别为14.86%左右71%和90.9 GHz。此外,双工器的两个输出端口之间的隔离大于-27.3dB。

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