首页> 外文会议>Electromagnetic Compatibility, 2009 20th International Zurich Symposium on >Study on the Characteristics of S21 and EMI on a Shifted Electromagnetic Band Gap (EBG) Structure
【24h】

Study on the Characteristics of S21 and EMI on a Shifted Electromagnetic Band Gap (EBG) Structure

机译:位移电磁带隙(EBG)结构上S21和EMI的特性研究

获取原文

摘要

AI-EBGs attenuate the through characteristics with broad bands of high frequency. AI-EBGs have structures in which sections of low characteristic impedance and high characteristic impedance are arranged periodically. However, the characteristics of radiated EMI of AI-EBGs are not well known. In this study, the characteristics of S21 and EMI are examined when the patch and the branch sizes are varied while the size of the printed circuit board and the number of patches are kept constant. In addition, the characteristics of S21 and EMI are examined when the dielectric thickness is varied. An AI-EBG structure with a thin dielectric is found to give the optimal S21 and EMI characteristics. Finally, a shifted EBG structure is proposed.
机译:AI-EBG会削弱高频宽带的直通特性。 AI-EBG具有其中低特性阻抗和高特性阻抗的部分被周期性地布置的结构。但是,AI-EBG的辐射EMI特性并不为人所知。在这项研究中,当贴片和分支尺寸变化而印刷电路板的尺寸和贴片数量保持恒定时,将检查S21和EMI的特性。另外,当电介质厚度变化时,还要检查S21和EMI的特性。发现具有薄电介质的AI-EBG结构可提供最佳的S21和EMI特性。最后,提出了一种移位的EBG结构。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号