首页> 外文会议>Electronics Manufacturing Technology Symposium, 1991., Eleventh IEEE/CHMT International >Elimination of Freon and methylchloroform from the manufacturingprocess for hybrid microelectronic circuits
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Elimination of Freon and methylchloroform from the manufacturingprocess for hybrid microelectronic circuits

机译:从生产中消除氟利昂和甲基氯仿混合微电子电路的工艺

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Recognizing the harmful effects of Freon and methylchloroformsolvents on the environment, Westinghouse embarked on an extensiveelimination/reduction program in connection with the manufacturing ofhybrid microelectronic circuits. Experiments were performed in thefollowing five key areas: thick film substrate fabrication, componentattachment, substrate mounting, wirebonding, and package sealing. Ineach area, it was possible to eliminate or to find a suitablealternative to Freon and methylchloroform. The following recommendationsare made: (1) Rosstech 119ME should be used for wet and dry thick filmpaste removal; (2) PF degreaser, acetone, and isopropyl alcohol shouldbe used for removal of leak test grease: and (3) isopropyl alcoholand/or plasma cleaning should be used for all other cleaning operations
机译:认识到氟利昂和甲基氯仿的有害影响 溶剂对环境的影响,西屋公司着手广泛 与生产制造相关的消除/减少计划 混合微电子电路。实验是在 以下五个关键领域:厚膜基板制造,组件 附件,基板安装,引线键合和封装密封。在 每个区域,都有可能消除或找到合适的区域 替代氟利昂和甲基氯仿。以下建议 制成:(1)湿法和干法厚膜应使用Rosstech 119ME 去除糊剂; (2)PF除油剂,丙酮和异丙醇应 用于去除泄漏测试油脂:和(3)异丙醇 和/或等离子清洁应用于所有其他清洁操作

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