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New techniques for elimination of the bird's head and bird's beak

机译:消除鸟头和鸟喙的新技术

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This paper introduces new techniques for the elimination of the infamous bird's head and bird's beak which result from the recessed Isoplanar technology. The first technique to be described is intended only for "scalping" the bird's head. The process utilizes a phosphogermanosilicate glass as a planarizing medium and a novel wet etching process for transferring the planarized surface into the protruding bird's head. The second technique to be described precludes the formation of a bird's beak in addition to removing the birds head structure. In this method, a polysilicon spacer is formed along the sidewall of the silicon island by LPCVD of poly and plasma etchback. The sidewall poly layer prevents oxygen penetration to the pad oxide during field oxidation, thereby eliminating the formation of a bird's beak.
机译:本文介绍了消除等距凹入等平面技术产生的臭名昭著的鸟头和鸟喙的新技术。将要描述的第一种技术仅用于“剥头皮”鸟的头。该工艺利用磷酸锗锗硅酸盐玻璃作为平面化介质,并采用新颖的湿法蚀刻工艺将平面化的表面转移到凸出的鸟头中。将要描述的第二种技术除了去除鸟的头部结构之外,还不能形成鸟的喙。在该方法中,通过多晶硅和等离子体回蚀的LPCVD,沿着硅岛的侧壁形成多晶硅隔离物。侧壁多晶硅层防止在场氧化过程中氧气渗透到衬垫氧化物中,从而消除了鸟喙的形成。

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