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A method of determining impurity diffusion coefficients and surface concentrations of drift transistors

机译:确定漂移晶体管的杂质扩散系数和表面浓度的方法

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In order to control the electrical parameters of drift transistors, it was found necessary to control the impurity concentration gradient in the base. An extension of the space charge widening theory provides a method of calculating this gradient, the surface concentration, and the diffusion coefficient. By this method, the diffusion coefficient of arsenic into germanium at 725°C was found to be3 times 10^{-12}cm2/sec, and the initial surface concentration was of the order of 1021atoms/cm3. Universal graphs for design calculations and rapid reference are presented.
机译:为了控制漂移晶体管的电参数,发现必须控制基极中的杂质浓度梯度。空间电荷加宽理论的扩展提供了一种计算该梯度,表面浓度和扩散系数的方法。通过这种方法,发现砷在725°C时在锗中的扩散系数为 3乘以10 ^ {-12} cm 2 / sec,并且初始表面浓度约为10 21 atoms / cm 3 。提出了用于设计计算和快速参考的通用图形。

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