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Quantum-computation-inspired reverse analysis texture synthesis

机译:量子计算启发式逆分析纹理合成

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We present a simple model for characterizing and synthesizing binary texture, whose main appeal is that it introduces the concept of reverse analysis, directly inspired by Quantum Computation. This approach allows to overcome the need of a synthesis algorithm, in the classical sense of the term. Instead, we compute, for every possible N×N pattern (N small), a set of M texture parameters. By selecting some texture parameters' values in the transformed space, we can readily identify the set of local patterns compatible with those parameters (reverse analysis). Then, we sample the local texture pattern by randomly choosing among them, same as if we were observing entangled qubit patterns. To provide visual continuity of adjacent patterns, we force them to match their pixels in overlapping areas. Although the texture model presented here is extremely simple (M = 3), results are promising, and the same concept could be applied to more sophisticated models.
机译:我们提供了一个用于表征和合成二进制纹理的简单模型,其主要吸引力在于它引入了直接受量子计算启发的反向分析的概念。在该术语的经典意义上,该方法允许克服合成算法的需求。相反,我们为每个可能的N×N模式(N小)计算一组M个纹理参数。通过在变换后的空间中选择一些纹理参数的值,我们可以轻松地确定与这些参数兼容的局部图案集(反向分析)。然后,我们通过随机选择局部纹理图案来进行采样,就像观察纠缠的量子位图案一样。为了提供相邻图案的视觉连续性,我们强制它们匹配重叠区域中的像素。尽管此处介绍的纹理模型非常简单(M = 3),但结果令人鼓舞,并且可以将相同的概念应用于更复杂的模型。

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