III-V semiconductors; aluminium compounds; doping profiles; gallium arsenide; high electron mobility transistors; indium compounds; semiconductor device noise; semiconductor doping; InAlAs-InGaAs; Pucel charge control based approach; correlation coefficient; donor-layer doping concentration; drain noise coefficient; gate noise coefficient; noise figure; separate gate DG-HEMT; temperature variation; Doping; Indium gallium arsenide; Logic gates; Noise; Noise figure; Performance evaluation; Double-gate HEMT; InAlAs/InGaAs; Noise; Separate-gate;
机译:一种基于精确电荷控制的对称门栅式InAlAs / InGaAs DG-HEMT噪声性能评估方法
机译:100 nm分离门InALAs / InGaAs DG-HEMT的RF表征
机译:具有不带栅极凹槽的液相氧化InGaAs栅极的InAlAs / InGaAs变质高电子迁移率晶体管的改进的微波和噪声性能
机译:基于综合电荷控制基于施移掺杂和供体层厚度对对称Tied-in Inalas / Ingaas DG-HEMT的P,R和C噪声系数的影响分析
机译:th(0.5-x)铅(0.5-x)p(2 x))锶(2- y)钡(y)钙(2)铜(3)氧(z)高-温度超导体以确定最佳钡浓度,并研究and和铅位中掺杂euro的影响。
机译:具有溅射介电层的高性能包裹栅InGaAs纳米线场效应晶体管
机译:纳米载体/ Ingaas DG-HEMT中增强栅极控制的量子建模,用于毫米波应用
机译:假晶基极 - 发射极间隔层对铍掺杂InGaas / Inalas异质结双极晶体管电流诱导退化的影响