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Impact of doping concentration and temperature variation on the noise performance of separate gate InAlAs/InGaAs DG-HEMT

机译:掺杂浓度和温度变化对单独栅极InAlAs / InGaAs DG-HEMT噪声性能的影响

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摘要

Impact of donor-layer doping concentration and temperature variation on the various noise coefficients and minimum noise figure is investigated for separate gate InAlAs/InGaAs DG-HEMT, in this paper. The noise coefficients, which include the drain noise coefficient (P), gate noise coefficient (R), the correlation coefficient (C) and the minimum noise figure have been evaluated using Pucel's charge control based approach. The behavior of P, R, C noise coefficients and the minimum noise figure with doping concentration and temperature variation predict their influence on the overall noise performance of the device.
机译:本文研究了分离栅极InAlAs / InGaAs DG-HEMT的施主层掺杂浓度和温度变化对各种噪声系数和最小噪声系数的影响。噪声系数包括漏极噪声系数(P),栅极噪声系数(R),相关系数(C)和最小噪声系数,已使用基于Pucel电荷控制的方法进行了评估。 P,R,C噪声系数的行为以及具有掺杂浓度和温度变化的最小噪声系数可预测它们对器件总体噪声性能的影响。

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