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Effects of Voltage and Temperature Variations on the Electrical Masking Capability of Sub-65 nm Combinational Logic Circuits

机译:电压和温度变化对65 nm以下组合逻辑电路电屏蔽能力的影响

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Single Event Transients (SETs) induced from radiation strikes on an integrated circuit (IC) can be masked electrically by logic gates while propagating through the circuit towards a storage element (e.g., flip-flop). With the continuous scaling of CMOS technology, there are simultaneous reductions in voltage, cell size, and internal capacitances that impact the properties of the gates. The combined impact causes a reduction in the electrical masking capability of the gates. The reduction in electrical masking means that transients are more likely to reach the storage elements. In addition, variations in voltage and temperature could enhance the propagation of transient towards the storage elements. This paper describes the effects of temperature and voltage variations on the electrical masking of sub-65 nm combinational logic circuits. The worst-case temperature increases the SET pulsewidth by 57.6%. The worst-case voltage increases the SET pulsewidth by 51.2%. The pulses are therefore less likely to be masked electrically.
机译:由集成电路(IC)上的辐射撞击引起的单事件瞬变(SET)可以在通过电路向存储元件(例如,触发器)传播的同时被逻辑门电屏蔽。随着CMOS技术的不断发展,电压,单元尺寸和内部电容的同时减小会影响栅极的性能。组合的冲击导致栅极的电屏蔽能力降低。电气屏蔽的减少意味着瞬态更有可能到达存储元件。另外,电压和温度的变化会增强瞬态向存储元件的传播。本文描述了温度和电压变化对低于65 nm的组合逻辑电路的电屏蔽的影响。最坏情况下的温度会使SET脉冲宽度增加57.6%。最坏情况下的电压会使SET脉冲宽度增加51.2%。因此,脉冲不太可能被电屏蔽。

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