首页> 外文会议>Conference on X-Ray Nanoimaging: Instruments and Methods;Society of Photo-Optical Instrumentation Engineers >Mechanical design of a flexural nanopositioning stage system for hard x-ray nanofocusing at the Advanced Photon Source 32-ID-C station
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Mechanical design of a flexural nanopositioning stage system for hard x-ray nanofocusing at the Advanced Photon Source 32-ID-C station

机译:先进的光子源32-ID-C站用于硬X射线纳米聚焦的挠曲纳米定位平台系统的机械设计

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The Transmission X-ray Microscope (TXM) at beamline 32-ID-C of the Advanced Photon Source (APS) is a highthroughput instrument with high spatial resolution for operando nano-tomography experiments [1]. Recently, a flexuralnanopositioning stage system has been designed, and constructed at the APS for a set of JTECTM Kirkpatrick-Baez (KB)mirrors to be installed at the beamline 32-ID-C station. It will focus X-ray down to a 15-20 nm focal spot that willserve as a point source for projection microscopy. Many flexural stages in the stage system are using the same designsdeveloped by APS for the beamline 34-ID-E [2]. However, the new stage system configuration is optimized for theoperation conditions at the APS 32-ID-C to accommodate large nano-tomography sample stages. The experiencesgained from this new flexural nanopositioning stage system design will benefit designs of K-B mirror nanofocusingstages for other x-ray nanoprobe beamline instruments at the APS-Upgrade project, especially for the In-SituNanoprobe instrument design. The mechanical design of the flexural stages, as well as its preliminary mechanical testresults with laser interferometer are described in this paper.
机译:高级光子源(APS)的光束线32-ID-C处的透射X射线显微镜(TXM)很高 用于手术纳米体层摄影实验的具有高空间分辨率的高通量仪器[1]。最近,弯曲 纳米定位平台系统已在APS上为一套JTECTM Kirkpatrick-Baez(KB)设计并建造 在光束线32-ID-C站上安装的反光镜。它将X射线聚焦到15-20 nm的焦点上 用作投影显微镜的点源。舞台系统中的许多挠性平台都使用相同的设计 由APS开发的光束线34-ID-E [2]。但是,新的舞台系统配置已针对 APS 32-ID-C的操作条件,可容纳大型纳米断层摄影样品台。经验 从这种新的弯曲纳米定位平台系统设计中获得的收益将有益于K-B镜面纳米聚焦的设计 APS升级项目中其他X射线纳米探针束线仪器的测试阶段,特别是现场测试 纳米探针仪器设计。弯曲阶段的机械设计及其初步的机械测试 本文介绍了激光干涉仪的测试结果。

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