Fabrication of Large-Size and High-Uniformity Thin Composite Emission Filter for Lens-Free Fluorescent Imager

摘要

We report a composite emission filter fabrication using laser lift-off (LLO) and plasma etching method. The LLO used a high energy laser to separates filter from its substrate, whereas a SiF_6 plasma etched silicon-substrate whereby the filter was deposited beforehand. As a result, spotless composite filters are successfully assembled in a micrometer-sized image sensor by LLO, yet the filter crack issue remains unsolved for large sensors. Conversely, the plasma etching produced large-size and spotless filters with relatively high reproducibility. This large-area etching capability, down to a centimeter range, can then be efficiently used for a multiple lens-free fluorescent device fabrication.