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DREAMPlace 3.0: Multi-Electrostatics Based Robust VLSI Placement with Region Constraints

机译:DREAMPlace 3.0:具有区域约束的基于多静电的稳健VLSI放置

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Placement is a critical step for modern very-large-scale integrated (VLSI) design closure. Recently, electrostatics-based analytical placement frameworks (ePlace) demonstrate promising performance in both solution quality and runtime. However, existing ePlace-based placers fail to meet the versatility and robustness requirements on various placement workloads. We propose a versatile and robust placer to solve region-constrained placement problems with better solution quality and faster convergence. We formulate the region- constrained placement problem into a multi-electrostatics system via virtual blockage insertion and field isolation. To achieve robust wirelength minimization with aggressive density constraints, we adopt self-adaptive quadratic density penalty and entropy injection techniques to automatically accelerate and stabilize the nonlinear optimization. Our experiments on ISPD 2015 benchmarks with region constraints demonstrate an average of > 13% HPWL improvement and> 11 % top5 overflow improvement compared with advanced region-aware placers Eh?Placer and NTUplace4dr. Our robustness-boost techniques show an average of ~1% and ~10% improvement in HPWL and runtime compared to DREAMPlace on ICCAD 2014 and ISPD 2019 benchmark suites.
机译:布局是现代超大规模集成(VLSI)设计关闭的关键步骤。最近,基于静电的分析放置框架(ePlace)在解决方案质量和运行时间方面均显示出令人鼓舞的性能。但是,现有的基于ePlace的放置程序无法满足各种放置工作负载的多功能性和鲁棒性要求。我们提出了一种通用且坚固的布局器,以更好的解决方案质量和更快的收敛速度来解决区域约束的布局问题。我们通过虚拟障碍物插入和场隔离将区域约束放置问题公式化为多静电系统。为了在具有严格的密度约束的情况下实现鲁棒的线长最小化,我们采用自适应二次方密度惩罚和熵注入技术来自动加速和稳定非线性优化。我们对具有区域限制的ISPD 2015基准进行的实验表明,与先进的区域感知布局器Eh?Placer和NTUplace4dr相比,HPWL的平均提升幅度超过13%,top5溢出的平均提升幅度超过11%。与ICCAD 2014和ISPD 2019基准套件上的DREAMPlace相比,我们的鲁棒性增强技术显示HPWL和运行时间分别平均提高了约1%和〜10%。

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