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Application of Noise to Avoid Overfitting in TCAD Augmented Machine Learning

机译:在TCAD增强机器学习中应用噪声以避免过度拟合

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In this paper, we propose and study the use of noise to avoid the overfitting issue in Technology Computer-Aided Design-augmented machine learning (TCAD-ML). TCAD-ML uses TCAD to generate sufficient data to train ML models for defect detection and reverse engineering by taking electrical characteristics such as Current-Voltage, IV, and Capacitance-Voltage, CV, curves as inputs. For example, the model can be used to deduce the epitaxial thicknesses of a p-i-n diode or the ambient temperature of a Schottky diode being measured, based on a givenIV curve. The models developed by TCAD-ML usually have overfitting issues when it is applied to experimental IV curves or IV curves generated with different TCAD setup. To avoid this issue, white Gaussian noise is added to the TCAD generated curves before ML. We show that by choosing the noise level properly, overfitting can be avoided. This is demonstrated successfully by using the TCAD-ML model to predict 1) the epitaxial thicknesses of a set of TCAD silicon diode IV’s generated with different settings (extra doping variations) than the settings in the training data and 2) the ambient temperature of experimental IV’s of Ga2O3 Schottky diode. Moreover, domain expertise is not required in the ML process.
机译:在本文中,我们提出并研究了噪声的使用,以避免技术计算机辅助设计增强机器学习(TCAD-ML)中的过拟合问题。 TCAD-ML使用TCAD生成足够的数据,通过将诸如电流-电压(IV)和电容-电压(CV)曲线等电气特性作为输入来训练用于故障检测和逆向工程的ML模型。例如,该模型可用于基于给定的IV曲线推导出p-i-n二极管的外延厚度或所测量的肖特基二极管的环境温度。当将TCAD-ML开发的模型应用于实验IV曲线或使用不同TCAD设置生成的IV曲线时,通常会出现过拟合问题。为避免此问题,在ML之前,将白高斯噪声添加到TCAD生成的曲线中。我们发现,通过适当选择的噪声水平,过度拟合是可以避免的。通过使用TCAD-ML模型预测1)使用与训练数据中的设置不同的设置(额外的掺杂变化)生成的一组TCAD硅二极管IV的外延厚度,成功地证明了这一点,并且2)实验的环境温度Ga2O3肖特基二极管的IV。此外,机器学习过程中不需要领域专业知识。

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