DD gate-voltage boosting circuit. The conventional gate-voltage boos'/> <tex>$(N+1)imes mathrm{V}_{mathrm{DD}}$</tex> Gate-Voltage Boosting Circuit
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$(N+1)imes mathrm{V}_{mathrm{DD}}$ Gate-Voltage Boosting Circuit

机译: $(N + 1)次 mathrm {V} _ { mathrm {DD}} $ 栅极电压提升电路

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This brief proposes an (N+1)×VDD gate-voltage boosting circuit. The conventional gate-voltage boosting circuit generates an output-voltage swing of 0~2VDD from the input-voltage swing of 0~VDD. The proposed circuit simply expands the output-voltage swing of 0~(N+1)×VDD by using N gate-voltage boosting stages. Each stage consists of a capacitor and three transistors and increases the swing voltage by VDD, but its boosted voltage is lower than VDD due to the parasitic capacitance. The proposed circuit was fabricated using a 65nm CMOS process. The measured output-voltage swings are 0~340mV, 0~495mV, and 0~658mV for the 2VDD, 3VDD, and 4VDD gate-voltage boosting circuits, respectively, at VDD=200mV. Their boost efficiency, which is the measured output over the ideal output (N×VDD), are 86%, 83%, and 83%, respectively.
机译:此摘要提出(N + 1)×V DD 栅极升压电路。传统的栅极升压电路产生0〜2V的输出电压摆幅 DD 从0〜V的输入电压摆幅 DD 。所提出的电路仅扩展了0〜(N + 1)×V的输出电压摆幅 DD 通过使用N个栅极升压级。每级由一个电容器和三个晶体管组成,并将摆幅电压增加V DD ,但其升压电压低于V DD 由于寄生电容。所提出的电路是使用65nm CMOS工艺制造的。对于2V,测得的输出电压摆幅为0〜340mV,0〜495mV和0〜658mV DD ,3V DD 和4V DD 栅极电压升压电路分别为V DD = 200mV。它们的升压效率,是理想输出(N×V上的实测输出) DD )分别为86%,83%和83%。

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