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Carrier density and mobility fluctuations due to carrier retrapping process in homogeneous semiconductors

机译:均质半导体中由于载流子重新俘获过程引起的载流子密度和迁移率波动

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It is shown that the free charge carrier capture-emission process causes both the charge carrier density and mobility fluctuations. In this report we present the calculation results in order to find out how the capture-emission process affects the free charge carrier mobility, and how the latter impacts the low-frequency noise level. The carrier mobility dependence on phonon, impurity and carrier-carrier scatterings and mobility change dependence on the electric field were taken into account. It is also shown that fluctuations of the charge carrier density and mobility due capture-emission process are completely correlated, and that their relaxation times are the same as for charge capture-emission process. The general expression for estimation of active capture center density in the sample from the low-frequency noise measurements is presented.
机译:结果表明,自由载流子俘获-发射过程同时引起载流子密度和迁移率波动。在此报告中,我们介绍了计算结果,以便了解捕获-发射过程如何影响自由电荷载流子迁移率,以及后者如何影响低频噪声水平。考虑了对声子的载流子迁移率,杂质和载流子-载流子的依赖性以及对电场的迁移率变化的依赖性。还表明,由于俘获-发射过程引起的电荷载流子密度和迁移率的波动是完全相关的,并且它们的弛豫时间与电荷俘获-发射过程相同。给出了从低频噪声测量中估计样品中活性捕获中心密度的一般表达式。

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