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Production, microstructural characterization and corrosion properties of Ni/B electrodeposits with low B content

机译:低B含量Ni / B电沉积物的生产,微结构表征和腐蚀性能

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Nanocrystalline or amorphous Ni-B coatings can be prepared by electroless or electrochemical deposition. Electroless deposition is performed using strong reducing agents, high temperature and high pH values. The plating process and the maintenance of the solution is much easier when electrodeposition is used as production method. In this work, Ni/B coatings with low amounts of B have been produced using a Ni sulfamate plating bath with the addition of dimethylaminborane. The influence of the B content on the various properties of the Ni-B alloys produced by electrodeposition has been investigated. The micros true ture of the obtained coatings has been observed by SEM both on top surface and cross section after metallographic etching and by X-ray diffraction. The B content on the produced deposits has been evaluated using GDOES. Selected specimens have been heat-treated at different temperatures and the effect of the heat treatment on the micrestructure has been evaluated. Both as plated and heat treated deposits have been characterized regarding their microhardness, corrosion resistance in different corrosive environments and wear resistance.
机译:可以通过化学沉积或电化学沉积来制备纳米晶体或非晶态的Ni-B涂层。使用强还原剂,高温和高pH值进行化学沉积。当使用电沉积作为生产方法时,电镀过程和溶液的维护要容易得多。在这项工作中,使用氨基磺酸镍电镀液并添加了二甲基氨基硼烷生产了具有少量B的Ni / B涂层。研究了B含量对电沉积Ni-B合金各种性能的影响。在金相蚀刻之后,通过SEM在顶表面和横截面上以及通过X射线衍射观察到所获得的涂层的微观特征。已使用GDOES对生产矿床中的B含量进行了评估。所选标本已在不同温度下进行了热处理,并评估了热处理对微结构的影响。无论是电镀沉积层还是热处理沉积层,其显微硬度,在不同腐蚀环境下的耐腐蚀性和耐磨性均得到了表征。

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