Periodic and metallic nano-structures patterned by contact transfer lithography with application on localized surface plasmon resonance

摘要

In this study, we demonstrate a rapidly, low cost, and mass production process to fabricate arrayed metallic nanoparticles on a variety of substrates based on contact transfer and metal mask embedded lithography (CMEL). A hexagonal arrayed metallic nanoparticles deployed on ITO/glass substrate with sub-micron periodicity is achieved. It is observed in optical transmittance measurements that noble metallic arrayed nanoparticles deployed on ITO/glass substrate result in a spectrally narrowband of extinction in visible range, and is in good agreement with the simulated results using finite-element method (FEM). It is found that the narrowband extinction spectrum is associated with electromagnetic field coupling between the arrayed metallic nanostructures and the ITO layer. This electromagnetic field coupling induces significant plasmon resonance in the ITO layer underneath the arrayed metallic nanostructures. Based on this observed phenomenon and our innovative large-area nano-fabrication processes, optoelectronic devices with arrayed metallic nanostructures can be easily designed and developed.