首页> 外文会议>IEEE International Electron Devices Meeting >Suppression of die-to-die delay variability of silicon on thin buried oxide (SOTB) CMOS circuits by balanced P/N drivability control with back-bias for ultralow-voltage (0.4 V) operation
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Suppression of die-to-die delay variability of silicon on thin buried oxide (SOTB) CMOS circuits by balanced P/N drivability control with back-bias for ultralow-voltage (0.4 V) operation

机译:通过具有反向偏置的平衡P / N可驱动性控制,可实现超低电压(0.4 V)操作的薄掩埋氧化物(SOTB)CMOS电路上硅的芯片间延迟延迟变化

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Small-variability transistors such as silicon on thin buried oxide (SOTB) are effective for reducing the operation voltage (Vdd). In the ultralow-Vdd regime, however, the upsurging delay (τpd) variability is the most important challenge. This paper proposes the balanced n/p drivability control method for reducing the die-to-die delay variation by back bias applicable for various circuits. Excellent variability reduction by this balanced control is demonstrated at Vdd = 0.4 V.
机译:诸如薄埋氧化硅(SOTB)上的硅之类的小变异晶体管可有效降低工作电压(V dd )。然而,在超低V dd 体制下,上升延迟(τ pd )变异性是最重要的挑战。本文提出了一种平衡的n / p可驱动性控制方法,该方法通过适用于各种电路的反向偏置来减小芯片到芯片的延迟变化。在V dd = 0.4 V时,通过这种平衡控制实现了出色的可变性降低。

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