Asymmetric microstructures for high light extraction and light pattern modulation

摘要

This work presents a novel method of fabricating asymmetric microstructures for light extraction enhancement and light pattern modulation. Asymmetric microstructures were fabricated at wafer level by two-step photolithography, surface energy modulation, and thermal reflow. The microstructures improve light extraction efficiency by suppressing total internal reflection and modulate far-field light distribution by changing incident angle of light. Light extraction and light pattern can be changed by design of asymmetric microstructures. These structures can be utilized for display and lighting applications.