首页> 外文会议>International Symposium on VLSI Technology, Systems and Applications >Analysis of Drain Current Enhancement in 'PN-Body Tied SOI-FET' -Bulk vs Surface Conduction Mode and Low Vds Saturation Effect-
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Analysis of Drain Current Enhancement in 'PN-Body Tied SOI-FET' -Bulk vs Surface Conduction Mode and Low Vds Saturation Effect-

机译:“PN-BAIVE TIED SOI-FET” - BULK VS表面传导模式下漏极电流增强分析及低VDS饱和效应 -

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We have proposed "PN-Body Tied SOI FET (PNBT-FET)" as a candidate of steep subthreshold slope (SS) devices, such as tunnel FETs and negative capacitance FETs, which will be a key device for expanding ultralow power IoT applications. We have already reported that PNBT-FET has SS below 1mV/dec over several orders of the drain current even with ultralow drain voltage of 0.1V [1] – [2] . We also reported the drain current (Id) enhancement effect on PNBT-FET, at previous IEEE SNW [3] .
机译:我们已经提出了“PN-Body Tied SOI FET(PNBT-FET)”作为陡峭的亚阈值斜坡(SS)器件的候选者,例如隧道FET和负电容FET,这将是用于扩展超级功率IOT应用的关键装置。 我们已经报告说,即使以超级漏极电压为0.1V [1] - [2],PNBT-FET也具有以下几个漏极电流的漏极电流低于1mV / DEC。 我们还报告了在先前的IEEE SNW上对PNBT-FET的漏极电流(ID)增强效果[3]。

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