首页> 外文会议>Corrosion conference and expo >ELECTROCHEMICAL STUDIES WITH COUPLED MULTIELECTRODE ARRAY SENSORS ON CORROSION INHIBITION OF COPPER AND AFFECTED METALS IN THE PRESENCE OF AMMONIA AND OTHER CORROSIVE IONS IN ZERO LIQUID DISCHARGE COOLING WATER
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ELECTROCHEMICAL STUDIES WITH COUPLED MULTIELECTRODE ARRAY SENSORS ON CORROSION INHIBITION OF COPPER AND AFFECTED METALS IN THE PRESENCE OF AMMONIA AND OTHER CORROSIVE IONS IN ZERO LIQUID DISCHARGE COOLING WATER

机译:耦合多电极阵列传感器的电化学研究在氧化铵和其他腐蚀离子存在下铜和受影响金属的腐蚀抑制

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Studies were performed with coupled multielectrode array sensors (CMAS) to establish the corrosion inhibition performance of azoles corrosion inhibitors for copper and metals normally corroded by the presence of ammonia. The studies were conducted with water at high pH and high total dissolved solids (TDS) that result from the operation of an evaporative cooling tower system at zero liquid discharge (ZLD). The study compares the effect of tolytriazole treated versus untreated water with chemistry at pH 10, low hardness (<100 mg/L as CaCO_3) and TDS of 150,000 mg/L along with the presence of silica corrosion inhibitor generated from source water. Laboratory test results are compared with field test results in a comparably treated ZLD system where "reclaim" water which contains significant residuals of ammonia is used for makeup to a cooling system with copper tube exchangers.
机译:用耦合的多电极阵列传感器(CMA)进行研究,以确定亚谷腐蚀抑制剂的腐蚀抑制性能,所述铜和金属通常通过氨存在腐蚀。在高pH和高总溶解固体(TDS)下用水进行研究,该水蒸发冷却塔系统在零液体排放(ZLD)中产生。该研究比较了在pH10,低硬度(<100mg / L作为CaCO_3)和150,000mg / L的TDS的低硬度(<100mg / L作为CACO_3)以及来自源水产生的二氧化硅腐蚀抑制剂的TDS的影响。将实验室测试结果与现场试验结果进行比较,在相对处理的ZLD系统中,其中包含含有显着残留的氨的“回收”水用于用铜管交换器进行化妆。

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