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Effect of annealing on the optical characteristics of electrodeposited <002>-oriented CuO thin films

机译:退火对电沉积<002>取向CuO薄膜光学特性的影响

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Formation of p-type CuO semiconductor films for the light absorption layer of photovoltaic cells was conducted by heteroepitaxial electrodeposition and post-annealing. The CuO films showed (002) orientation through the heteroepitaxial growth on the (111)-oriented Au substrate. The structural, optical, and electrochemical characterizations were carried out with X-ray diffraction (XRD), optical absorption spectra measurements, and photoelectrochemical response measurement. The bandgap energy changed from 1.05 to 1.22 eV depending on the annealing condition. It is speculated from the XRD that the CuO film with large grain size and small strain could be obtained at 300°C. The photoelectrochemical response has improved depending on the annealing condition. The annealed CuO films possess much better crystallinity and photoelectrochemical response than as-deposited CuO. The CuO film annealed at 300°C has the best quality.
机译:通过异质外延电沉积和后退火进行用于光伏电池的光吸收层的p型CuO半导体膜的形成。 CuO膜通过在(111)取向的Au衬底上的异质外延生长而显示出(002)取向。用X射线衍射(XRD),光吸收光谱测量和光电化学响应测量进行结构,光学和电化学表征。根据退火条件,带隙能量从1.05 eV变为1.22 eV。从X射线衍射可知,在300℃下可获得大粒径且小应变的CuO膜。取决于退火条件,光电化学反应得到了改善。退火后的CuO薄膜比沉积后的CuO具有更好的结晶度和光电化学响应。在300°C退火的CuO膜具有最好的质量。

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