Current highpower microwave (HPM) sources generate very short pulses. The durations of such pulses are much less than the characteristic time of mechanical movement in the traditional reverberation chambers (RCs). Thus it is not suitable to use mechanical stirring to research the HPM effect on the subsystems such as electronic or electric equipments in the RC However, the way of source stirring, without mechanical tuning equipments, is feasible to stir the field distribution in the RC by changing the positions of the sources. This article mainly studies the influence of source stirring on the field distribution in RC under short HPM pulse excitation. Firstly, the source's position is proved to be an important factor that may affect the field distribution. Then the focus is on the effects of moving the sources consecutively on the characteristics of the electromagnetic field. As a statistical process, the main attention is paid to the maximums and the standard deviations of the electric field strength. The results show that it is capable to stir the field and enhance the homogeneity of field distribution with source stirring. Therefore, the method of source stirring can improve the field uniformity effectively and it is valid to make a homogenous electromagnetic field environment for HPM effect tests.
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