首页> 外文会议>2011 Abstracts IEEE International Conference on Plasma Science >Introducing hairpin probe for electron density measurement in a KAMABOKO-III negative ion source
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Introducing hairpin probe for electron density measurement in a KAMABOKO-III negative ion source

机译:推出用于在KAMABOKO-III负离子源中测量电子密度的发夹式探针

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Neutral beam injection based on a negative ion source is one of the most promising candidates for heating and current drive in future fusion reactors. The physical and chemical processes involved in the filter field region of an ion sources are especially important to investigate, as this is the region where the negative ions are mainly generated and extracted. The externally applied magnetic/filter field around 0.012T cools the high-energy electrons in order to avoid collisional destruction of the negative ions. The electron density (ne) measurements using conventional diagnostic techniques such as Langmuir Probe (LP) and Optical Emission Spectroscopy becomes complicated in presence of negative ions as well as magnetic field and gives a qualitative result. For accurate det ermination of ne in such complex plasma, the floating resonance hairpin probe1 (HP) is applied in KAMABOKO-III negative ion source, at the MANTIS test bed in CEA Cadarache, France. The technique is based on measuring the plasma permittivity using a U-shaped microwave resonating structure whose relative shift of characteristics frequency in plasma from that in vacuum directly gives the ne without rely on any other plasma parameter. However, in the presence of magnetic field the plasma density becomes anisotropic and thus the HP gives an effective ne measurement within its spatial resolution. The measured ne is compared with the positive ion density measured by planar LP. The ne is studied as a function operating source parameters such as arc power, pressure, applied magnetic field and the plasma grid bias exclusively in the filter field region. The effect of probe orientation to the B-field on the resonant properties is also studied under given plasma conditions. The performance of the HP shows that the technique is more reliable, sensitive and accurate diagnostic tool for such ion source.
机译:基于负离子源的中性束注入是未来聚变反应堆中加热和电流驱动的最有希望的候选者之一。离子源的过滤场区域所涉及的物理和化学过程对于研究尤为重要,因为这是主要产生和提取负离子的区域。为了避免负离子的碰撞破坏,外部施加的大约0.012T的磁场/过滤器磁场会冷却高能电子。在存在负离子以及磁场的情况下,使用常规诊断技术(例如Langmuir探针(LP)和光发射光谱法)进行的电子密度(n e )测量变得很复杂,并给出了定性结果。为了在这种复杂血浆中准确测定n e ,在MANTIS测试台上,将浮动共振发夹探针 1 (HP)用于KAMABOKO-III负离子源在法国CEA卡达拉奇市。该技术基于使用U形微波谐振结构测量等离子体介电常数的方法,该结构的等离子体中特征频率相对于真空中特征频率的相对位移直接给出n e ,而无需依赖任何其他等离子体参数。但是,在存在磁场的情况下,等离子体密度将变为各向异性,因此HP在其空间分辨率内会给出有效的n e 测量值。将测量的n e 与通过平面LP测量的正离子密度进行比较。专门研究n e 作为函数的源操作参数,例如电弧功率,压力,施加的磁场和等离子栅偏置,仅在滤波器场区域内。在给定的等离子体条件下,还研究了探头定向到B场对共振特性的影响。 HP的性能表明,该技术是用于此类离子源的更可靠,灵敏和准确的诊断工具。

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