Patterning Technology for Nanomanufacturing

摘要

Zone-plate-array lithography (ZPAL) was developed with the objective of combining the simplicity, throughput and accuracy of optical patterning with the flexibility and resolution of an electron-beam [1]. High throughput is achieved using a massively parallel array of photon beams, focused onto a substrate through high-numerical-aperture diffractive-optical lenses [2]. Patterns of arbitrary geometry are created in a dot-matrix fashion as the substrate is scanned across the focal plane. Incident light to each lens is modulated synchronously with the scanning of the stage using a spatial-light modulator upstream of the zone-plate array.lumarray's zp-150 beta-tool was designed with emphasis on flexibility for low-volume manufacturing; prototyping and r&d. the stability of photon optics enables pattern-placement errors to be corrected in software. Proximity-effect correction (pec) is implemented for improved patterning fidelity. The zp-150 beta tool is capable of resolution down to 150 nm linewidths in dense patterns. Absorbance-modulation offers the possibility of extending patterning resolution to -20 nm; while retaining all the benefits of maskless optical lithography.