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Evaluation of the X-Ray Response of Amorphous Selenium Coated 100 micron pitch a-Si Active Pixel Sensors for Tomosynthesis Applications

机译:用于断层合成应用的非晶硒涂层100微米间距a-Si有源像素传感器的X射线响应评估

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We detail the integration of hydrogenated amorphous silicon (a-Si:H) active pixel sensor (APS) test arrays with an overlying amorphous selenium (a-Se) x-ray photoconductor, and report on results of their x-ray response and imaging properties. The a-Se/a-Si:H APS arrays incorporate a two-transistor (2T) gate-switched pixel amplifier architecture designed to provide high detector array resolution, as well as a controllable on-pixel gain. The direct x-ray detectors consist of in-house fabricated, dual mode active and passive sensor arrays with detector element (del) pitches of 100 μm and 200 μm, coated with an 80 μm thick stabilized amorphous selenium layer. These selenium layers were selected for preliminary work and represent a quantum efficiency (QE) of 69% for x-ray spectra (tungsten target, 0.44 mm Al filtration) of 35 kV. Detector response was evaluated for a-Se bias fields of both 5 V/μm and 10 V/μm. A detector dark current of 110 pA/cm_2 (0.01 pA/100 μm del) at 10V/μm electric field, a controllable detector conversion gain up to 15.3 nA/mR at 30 kVp were measured. Active pixel gains of 6.7 and 9.6 were measured for 100 μm and 200 μm pitch detectors respectively. The amplified readout exhibits a better detection limit (by one order of magnitude) compared to the passive readout implemented on the same pixel. Capabilities of amplified pixels such as nondestructive readout, as well as programmable pixel conversion gain, and dynamic range control are demonstrated. In light of their adaptable gain and dynamic range, these detectors represent a promising technology for high-resolution high gain x-ray digital imaging, particularly in mammography tomosynthesis.
机译:我们详细介绍了氢化非晶硅(a-Si:H)有源像素传感器(APS)测试阵列与上覆的非晶硒(a-Se)X射线光电导体的集成,并报告了其X射线响应和成像的结果特性。 a-Se / a-Si:H APS阵列采用了两晶体管(2T)栅极开关像素放大器架构,旨在提供高检测器阵列分辨率和可控的像素上增益。直接X射线探测器由内部制造的双模式有源和无源传感器阵列组成,其探测器元件(del)的间距分别为100μm和200μm,并涂有80μm厚的稳定非晶硒层。选择这些硒层进行初步工作,对于35 kV的X射线光谱(钨靶,0.44 mm Al过滤),量子效率(QE)达到69%。针对5 V /μm和10 V /μm的a-Se偏置场评估了探测器的响应。在10V /μm电场下,检测器暗电流为110 pA / cm_2(0.01 pA / 100μmdel),在30 kVp下可测量的检测器转换增益高达15.3 nA / mR。对于100μm和200μm间距检测器,分别测得6.7和9.6的有源像素增益。与在相同像素上实现的无源读数相比,放大后的读数具有更好的检测极限(一个数量级)。演示了无损读出等放大像素的功能,以及可编程的像素转换增益和动态范围控制。鉴于其适应性强的增益和动态范围,这些检测器代表了高分辨率高增益X射线数字成像(特别是在乳腺X线断层扫描合成中)的有前途的技术。

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