Production of Extreme Ultraviolet (EUV) Quality Silicon Carbide(SiC) Aspheric Optics

摘要

L-3 Communications, SSG-Tinsley reports the optical performance demonstrated with an EUV quality aspheric mirror. The off axis ellipsoidal reflector demonstrates a surface figure of < 3 nm RMS and a surface finish which ranges from 3 - 7 Angstroms RMS depending on the spatial period of interest. Interferometric data is provided along with surface roughness results obtained with phase measuring microscopy. The capability to produce high quality SiC aspheric optics, combined with the inherent thermal stability associated with SiC, enables a number of advanced mission concepts, including next generation solar observing.