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Density functional calculations of the binding energies and adatom diffusion on strained AlN (0001) and GaN (0001) surfaces

机译:在应变AlN(0001)和GaN(0001)表面上的结合能和原子扩散的密度泛函计算

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Density functional calculations were carried out to study the binding energies and diffusion barriers of various adatoms on AlN and GaN (0001) surfaces. The binding energies and potential energy surfaces were investigated for Al, Ga, and N adatoms on both Al (Ga) terminated and N terminated (0001) surfaces of AlN (GaN). Calculations were performed to investigate the diffusion paths and obtain diffusion energy barriers of these adatoms. It was found that the N adatom on N terminated AlN and GaN surfaces faces a high diffusion barrier due to strong N-N bond. The Al and Ga adatom on Al (Ga) terminated AlN (GaN) surfaces showed lower diffusion barriers due to the weak metallic bonds. However, the diffusion barrier for an Al adatom was always larger than that of a Ga adatom on any surface. To investigate the effect of strain on diffusion barriers the surfaces were subjected to a hydrostatic compressive and tensile strain in the range of 0 to 5%. The diffusion energy barrier for N adatom on N terminated AlN and GaN surfaces decreased when the strain state was changed from tensile to compressive. In contrast, Al and Ga adatoms show continuous increase in diffusion barriers from tensile to compressively strained Al (Ga) terminated AlN (GaN) surfaces.
机译:进行密度泛函计算以研究AlN和GaN(0001)表面上各种原子的结合能和扩散势垒。研究了AlN(GaN)的Al(Ga)末端和N末端(0001)表面上的Al,Ga和N原子的结合能和势能表面。进行了计算以研究这些扩散原子的扩散路径并获得扩散能垒。已经发现,由于强的N-N键,在N终止的AlN和GaN表面上的N吸附原子面对高的扩散阻挡层。由于弱的金属键,在Al(Ga)终止的AlN(GaN)表面上的Al和Ga原子显示出较低的扩散势垒。但是,在任何表面上,Al原子的扩散势垒总是大于Ga原子的扩散势垒。为了研究应变对扩散阻挡层的影响,对表面施加了0%至5%的静水压缩和拉伸应变。当应变状态从拉伸状态变为压缩状态时,N终止的AlN和GaN表面上N原子的扩散能垒降低。相反,Al和Ga原子显示出从拉伸到压缩应变的Al(Ga)终止的AlN(GaN)表面的扩散势垒不断增加。

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