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Experimental Results on the Fabrication Parameters of ZnS:Mn Phosphor Layer in Inorganic Thick Dielectric Electroluminescent (TDEL) Displays

机译:无机厚介电电致发光(TDEL)显示器中ZnS:Mn荧光粉层制造参数的实验结果

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TDEL devices were fabricated at various ZnS: Mn phosphor fabrication parameters. ZnS: Mn phosphor of all devices was formed by electron beam evaporation from ZnS: Mn powder with 1.2 wt. % Mn content. The brightness of TDEL devices was affected by the phosphor fabrication parameters, such as deposition rate, substrate temperature and annealing temperature. The optimal deposition rate and substrate temperature were 5-8 (A)/s and 280°C, respectively, and led to the biggest brightness of TDEL devices. The luminescent properties of TDEL devices was improved by an annealing process of ZnS: Mn layer, and the most optimal brightness-voltage curve (that is, the biggest brightness and the steepest curve ) of TDEL devices was obtained by an annealing temperature of 500°C. The improvement of luminescent properties of TDEL devices by the optimal substrate temperature and annealing temperature of ZnS: Mn layer was attributed to the crystalline improvement of ZnS: Mn layer and the uniform diffusion of Mn +.
机译:在各种ZnS:Mn磷光体制造参数中制造TDEL器件。 ZnS:所有器件的Mn磷光体通过电子束从ZnS:Mn粉末蒸发形成,其中Mn粉末为1.2重量。 %Mn含量。 TDEL器件的亮度受磷光体制造参数的影响,例如沉积速率,衬底温度和退火温度。最佳沉积速率和衬底温度分别为5-8(a)/ s和280°C,并导致TDEL器件的最大亮度。通过ZnS:Mn层的退火过程提高了TDEL器件的发光特性,通过500°的退火温度获得TDEL器件的最佳亮度电压曲线(即,最大亮度和最粗曲线) C。通过ZnS的最佳衬底温度和退火温度提高TDEL器件的发光特性:Mn层归因于ZnS:Mn层的晶体改善和Mn +的均匀扩散。

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