Fabrication of femtosecond laser induced Bragg gratings in amorphous and crystalline dielectric waveguides

摘要

Phase mask assisted fabrication of Bragg gratings in Ge-doped SMF-28 fiber with an ultrafast 800nm IR laser was first demonstrated in 2003. The wide variety of materials accessible to ultrafast laser modification allows for the fabricating of components that were not previously realizable with UV laser photosensitivity. Ultrafast fabricated gratings themselves have proven to have a number of common properties with UV induced gratings, and some unique elements. This paper will introduce phase mask assisted ultrafast infrared induced grating fabrication and some of their unique properties.