Plasma Activated EB EB-PVD of Titanium and its Compounds by Means of Large Area SAD

摘要

Plasma activation of e electron beam physical vapor deposition (EB lectron EB-PVD) allows to increasedensity, hardness, refractive index and other properties of evaporated coatings.This contribution refers to (reactive) spotless arc activated deposition (SAD) of coatings fromtitanium an and its compounds TiO d TiO2 and TiN. Electron beam evaporation is combined with theignition of a spotless arc discharge on the EB heated titanium metal and in case ofcompounds additional process gas inlet. The process combination has been extended tolarge area dimensions. Achieved layer properties, coating rates and layer thicknessdistributions on large substrates will be presented. The technological capacity of (reactive)large area SAD will be considered with regard to advantageous applications.