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Minimum testing requirements to screen temperature dependent defects

机译:筛选温度相关缺陷的最低测试要求

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While much progress has been made screening common defects and outliers, less emphasis has been placed on testing for performance outliers and defects across the expected operating temperature range. The subject of this paper is an analysis of the minimum testing required to screen temperature dependent outliers at wafer sort and final test. The analysis is based on data obtained from 20 wafers of a 0.18 /spl mu/m skew lot and at the two temperatures 30/spl deg/C and 85/spl deg/C. The results demonstrate a need for defect screening at multiple temperatures and the advantage of die trace in multiple temperature testing.
机译:尽管在筛查常见缺陷和离群值方面已取得了很大进展,但在预期的工作温度范围内,对性能离群值和缺陷的测试却较少受到关注。本文的主题是对在晶圆分类和最终测试中筛选温度相关异常值所需的最低测试的分析。该分析基于从0.18 / spl mu / m倾斜批次的20个晶片获得的数据,并且在两个温度分别为30 / spl deg / C和85 / spl deg / C时获得。结果表明需要在多个温度下进行缺陷筛查,并需要在多个温度测试中使用芯片痕迹。

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