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Highlights of the 2002 national electronic manufacturing technology roadmaps and their applicability to China

机译:2002年国家电子制造技术路线图的重点及其在中国的适用性

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This presentation describes the roadmapping process used in North America, highlights key global results of the 2002 edition, and suggests how this roadmap and the roadmap process might benefit the electronics industry in China. The 2002 national electronic manufacturing technology roadmap (NEMI, 2002) was released by NEMI on April 1, 2003. This edition of the biennial roadmap is over 1000 pages long and was produced by over 350 individuals from over 170 industrial, government, and academic institutions in North America in cooperation with SIA (Semiconductor Industry Association), IRC, IMAPS (International Microelectronics and Packaging Society), USDC (United States Display Consortium), NSIC (National Storage Industry Consortium), and OIDA (Optoelectronics Industry Development Association). It contains eighteen individual technology roadmaps covering all aspects of the global electronics industry and its supply chain.
机译:本演示文稿描述了北美使用的路线贴图过程,突出了2002年版的关键全球结果,并提出了这种路线图和路线图工艺如何使中国电子行业受益。 2002年2002年国家电子制造技术路线图(NEMI,2002)由Nemi于2003年4月1日发布。本届两年期的双年路线图已超过1000页,由超过170多个工业,政府和学术机构的350多个人生产在北美与SIA(半导体行业协会)合作,IRC,IMAPS(国际微电子和包装协会),USDC(美国展示联盟),NSIC(国家储存行业财团)和OIDA(光电子工业发展协会)。它包含十八个个人技术路线图,涵盖了全球电子行业及其供应链的各个方面。

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