Method of microlens array fabricated by inorganic photoresist

摘要

It has been shown that it is possible to fabricate very small lenses by melting islands of inorganic photoresist on a glass substrate. The inorganic photoresist composited in our laboratory is suitabel to be exposed bb Electron Beam (EBE) or X-Ray.We have obtained the lithophotography pattern with 0.6 um m line width by EBE exposure. Because the resist pattern wilnot swell and distort during the processing, there is no problem of shelf life. We have made lenses with diameter from 0.8 mm to 1.0 mm, in the form of spheres, and have studied their opticla properties.