首页> 外文会议>Electron Devices Meeting, 2000. IEDM Technical Digest. International >Role of long-range and short-range Coulomb potentials in threshold characteristics under discrete dopants in sub-0.1 /spl mu/m Si-MOSFETs
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Role of long-range and short-range Coulomb potentials in threshold characteristics under discrete dopants in sub-0.1 /spl mu/m Si-MOSFETs

机译:低于0.1 / spl mu / m的Si-MOSFET中远距离和短距离库仑电势在阈值特性中的作用

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摘要

We investigate the Coulomb potential associated with discrete dopants in sub-0.1 /spl mu/m Si-MOSFETs from the physical viewpoint. It is found that the discrimination of the Coulomb potential between the long-range and short-range parts is essential in correctly simulating the device characteristics under nonuniform discrete dopants. A new dopant model appropriate for the 3D drift-diffusion (DD) simulations is proposed and it is demonstrated that the present model could properly take into account the threshold voltage variations in sub-0.1 /spl mu/m MOSFETs.
机译:从物理的角度,我们研究了亚微米0.1 / spl mu / m Si-MOSFET中与离散掺杂物相关的库仑电势。已经发现,在正确地模拟非均匀离散掺杂剂下的器件特性时,区分长距离部分和短距离部分之间的库仑电势是至关重要的。提出了一种适用于3D漂移-扩散(DD)模拟的新型掺杂剂模型,并证明了该模型可以适当地考虑0.1-spl mu / m MOSFET以下的阈值电压变化。

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