Chemical and thermal stability of fluorinated amorphous carbon films for interlayer dielectric applications

摘要

The thermal and chemical stability of low k fluorinated amorphous carbon (a-C:F) material, deposited by a novel co-sputtering process using both polytetrafluoroethylene (PTFE) and graphite targets was dinvestigated. Thin films of a-C:F with fluorine concentration of 2-55