Surface relief gratings in self-developing photopolymer films

摘要

Abstract: Dichromated poly(acrylic acid) (DCPAA) films with dimethyl formamide (DMF) have ben sued to photofabricate surface relief gratings. The formation of those gratings depends on the self-development time in darkness subsequent to the illumination at a wavelength of 442 nm and is obtained without any chemical treatment or wet processing. The modulation depth of those holographic surface relief gratings and the spatial frequency response of the thin DCPAA-DMF films have been chosen to characterize that self- developing photopolymer system. Those holographic characteristics are presented in this paper. !16