首页> 外文会议>Liquid Crystal Materials, Devices, and Applications V >Optimization strategies for MACH: a novel electrically controllable computer-generated hologram
【24h】

Optimization strategies for MACH: a novel electrically controllable computer-generated hologram

机译:MACH的优化策略:一种新型的电控计算机生成全息图

获取原文

摘要

Abstract: The MACH (multiple, active, computer generated hologram) is a novel device combining aspects of computer generated holography with electrically controllable diffraction gratings. As such, it provides an interesting capability, falling somewhere between that of conventional fixed hologram and electrically addressed spatial light modulator (SLM) approaches to wavefront generation. Under the control of a single applied voltage, the device can selectively generate any one of a number of desired, uncorrelated optical wavefronts or wavefront transformations. Compared to the SLM, it is considerably more economical to fabricate, requires fewer supporting electronic subsystems, is more reliable and promises higher space bandwidth products. The device operating principles are outlined, showing that the ultimate performance of the MACH is, to a large extent, governed by the ability to determine the required substrate surface relief pattern. The various approaches to optimizing this highly constrained design problem are then described. These include developments of the direct search (pixel flipping) and projection algorithms. The latter in particular seem to provide an efficient way of calculating analogue, pixelated profiles, necessary for high performance MACH devices. Example results from various device optimizations are given. Following a discussion of rigorous device modeling and fabrication techniques, initial experimental results are presented, and potential applications discussed. !19
机译:摘要:MACH(多个活动的计算机生成的全息图)是一种新颖的设备,将计算机生成的全息图与电可控衍射光栅结合在一起。这样,它提供了一种有趣的功能,介于传统的固定全息图和电寻址的空间光调制器(SLM)产生波阵面的方法之间。在单个施加电压的控制下,设备可以有选择地生成许多所需的,不相关的光波阵面或波阵面变换中的任何一个。与SLM相比,它制造起来更加经济,需要更少的支持电子子系统,更可靠,并有望提供更高的空间带宽产品。概述了器件的工作原理,表明MACH的最终性能在很大程度上取决于确定所需基板表面浮雕图案的能力。然后介绍了用于优化此高度受限的设计问题的各种方法。这些包括直接搜索(像素翻转)和投影算法的开发。特别是后者似乎为计算高性能MACH设备所需的模拟像素化轮廓提供了一种有效的方法。给出了各种设备优化的示例结果。在讨论了严格的器件建模和制造技术之后,我们给出了初步的实验结果,并讨论了潜在的应用。 !19

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号