2000 5th International Symposium on Plasma Process-Induced Damage(IEEE Cat. No.00TH8479)

摘要

The following topics were dealt with: charging damage; gate oxides; SOI technology; CVD processing; electron shading; front-end processing; multilevel interconnects; 300 mm technology; copper and low-κ dielectrics; dielectric thin films; antenna test structures; interlevel dielectrics.