Taking the multi-wavelength DBO to the next level of accuracy and robustness

摘要

In multi patterning processes, overlay is now entangled with CD including OPC and stochastics. This combined effect is a serious challenge for continued shrink and is driving down the allowed overlay margin to an unprecedented level. We need to do everything to improve overlay where accurate measurement and control of wafer deformation is extremely important. This requires accuracy in overlay metrology that decouples target asymmetry from wafer deformation. Multi-wavelength diffraction-based overlay (DBO) is positioned for providing such accuracy while maintaining the required measurement speed. At the same time, with the increase of process complexity in advanced nodes, several new types of target asymmetries are introduced. Some of such asymmetries vary even within the target / grating area (intra-grating) and some are so severe that it impacts the center of gravity shift of the overlay target. This technical publication will reveal several accuracy and robustness enhancement techniques that utilizes the full benefit of dark-field (image-plane) DBO in order to address the above mentioned target asymmetry issues.