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Mapping the optical dielectric response of isolated monolayer M0S2 by push-broom microspectroscopy

机译:通过推扫显微光谱绘制孤立的单层M0S2的光介电响应

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Two-dimensional van der Waals materials are attractive for photonics and optoelectronics due to distinctive layer-dependent optical properties. Optical properties based on light-matter interactions have been revealed by modern imaging and spectroscopy techniques. Hyperspectral imaging microscopy working in line-scan mode (push-broom microspectroscopy) can provide abundant spectral information covering a large area compared to conventional spectroscopy techniques, with a higher acquisition speed than point-scan techniques such as atomic force microscopy and Raman imaging microscopy. This contribution studies in-depth the reconstruction of 3D datacubes and the extraction of optical responses of the sample. Monolayer MoS_2, a subclass of semiconducting two-dimensional materials, is fabricated by the mechanical exfoliation method on the SiO_2/Si substrate with an oxide thickness of 285 nm. The isolated monolayer MoS: is observed and identified by a conventional optical microscope. The custom-built push-broom microspectroscope is utilized to scan the region of interest, with the whole spectrum of every line recorded at each frame. The spectral information of every point is collected and 3D spectral data sets are reconstructed for feature extraction and property analysis. To realize the thickness mapping of flakes, linear unmixing is employed to calculate the abundance of isolated monolayer MoS_2 on the SiO_2/Si substrate, improving flake identification performances. The characteristic spectrum of monolayer MoS_2 is acquired by averaging the spectrum from the monolayer MoS; flake. Furthermore, the optical dielectric response is further analyzed by Kramers-Kronig constrained analysis and Fresnel-law-based analysis. The optical dielectric function is calculated and compared based on the refractive index and medium thickness. This detailed analysis of optical dielectric responses highlights the feasibility of push-broom microspectroscopy for two-dimensional materials characterization.
机译:二维范德华材料因其与层有关的独特光学特性而吸引了光子学和光电子学。现代成像和光谱技术已经揭示了基于光-质相互作用的光学性质。与常规光谱技术相比,以线扫描模式工作的高光谱成像显微镜(推扫式显微技术)可以提供覆盖大面积的丰富光谱信息,并且比点扫描技术(例如原子力显微镜和拉曼成像显微镜)具有更高的采集速度。这一贡献深入研究了3D数据立方体的重建以及样品光学响应的​​提取。单层MoS_2是半导体二维材料的子类,是通过机械剥离法在SiO_2 / Si衬底上以285 nm的氧化物厚度制造的。通过常规光学显微镜观察和鉴定分离的单层MoS :。定制的推扫式显微光谱仪用于扫描感兴趣的区域,并在每一帧记录每条线的整个光谱。收集每个点的光谱信息,并重建3D光谱数据集以进行特征提取和属性分析。为了实现薄片的厚度映射,采用线性分解技术计算了SiO_2 / Si基体上孤立的单层MoS_2的丰度,提高了薄片的识别性能。单层MoS_2的特征光谱是通过平均单层MoS的光谱获得的;薄片。此外,通过Kramers-Kronig约束分析和基于菲涅耳定律的分析进一步分析了光介电响应。根据折射率和介质厚度计算并比较光学介电函数。光学介电响应的这一详细分析突显了推扫显微技术在二维材料表征中的可行性。

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