UV exposure: a novel processing method to fabricate nanowire solar cells

摘要

We demonstrate a novel and rapid method for nanowire (NW) solar cell processing. NW arrays were embedded in photoresist. The strong absorption of light in the NWs leads to self-limited exposure of the resist, which enables selective removal of the exposed part of the resist, opening up for the tips of the NWs and further processing. The UV-exposure technology allows a fast and low-cost process compared to the conventional reactive ion etching method.