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10T and 8T Full Adders Based on Ambipolar XOR Gates with SB-FinFETs

机译:基于双极性异或门与SB-FinFET的10T和8T全加法器

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We introduce novel ten (10T) and eight (8T) transistor full-adder logic gates based on recently proposed gate workfunction engineering (WFE) approach. When applied to sub-10 nm Schottky-barrier (SB) independent-gate FinFETs, WFE leads to hitherto unexplored 4T and 3T XOR implementations that operate with either only one or no inverted input, respectively. The novel 4T and 3T XOR gates eliminate the need for inverted inputs provided that ambipolar I-V characteristics is shifted by the associated gate work-function in the right direction, where another conduction channel exists. Following the logic verification of the novel 4T and 3T XOR gates via TCAD simulations, we then continue to show how these novel gates can be put to use in building ultra-compact 10T and 8T full-adder circuits, which would normally require up to 20 FinFETs in conventional CMOS architecture. Simulated power-delay products of the novel full-adders show significant (~5×) improvement in dynamic performance attributed largely to the 50% reduction in total area as well as parasitics, at the expense of loss in noise margins. Besides the full-adders explored, the presented WFE approach could in general provide area and performance gains also for other logic building blocks that can be redesigned using SB-FinFETs.
机译:基于最近提出的栅极功函数工程(WFE)方法,我们介绍了新颖的十(10T)和八(8T)晶体管全加器逻辑门。当将WFE应用于低于10 nm的肖特基势垒(SB)独立栅极FinFET时,WFE导致了迄今未开发的4T和3T XOR实施方案,它们分别仅使用一个反向输入或不使用反向输入。新颖的4T和3T XOR栅极消除了对反向输入的需求,只要双极性I-V特性被相关的栅极功函数沿正确的方向(存在另一个导电通道)移动即可。在通过TCAD仿真对新颖的4T和3T XOR门进行逻辑验证之后,我们将继续展示如何将这些新颖的门用于构建超紧凑的10T和8T全加法器电路,通常需要多达20个电路。常规CMOS架构中的FinFET。新型全加器的模拟功率延迟产品显示出动态性能的显着改善(〜5倍),这主要归功于总面积和寄生虫减少了50%,但以降低噪声裕量为代价。除了探索的全加器之外,提出的WFE方法通常还可以为其他可以使用SB-FinFET重新设计的逻辑构建块提供面积和性能方面的提升。

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