1-x(C,Sn) Atomistic analysis of localisation and band mixing effects in Ge<inf>l</inf>-ϰC,Sn)ϰ group-IV alloys
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Atomistic analysis of localisation and band mixing effects in Gel-ϰC,Sn)ϰ group-IV alloys

机译:Ge l -ϰC,Sn)ϰ IV族合金的局域化和能带混合效应的原子分析

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We present a theoretical analysis of the electronic structure of the group-IV alloys Ge1-x(C,Sn)x. Our analysis is based on a semi-empirical tight-binding model, parametrised via hybrid density functional theory calculations. Using atomistic alloy supercell calculations we identify and quantify the respective roles played by C-related localised impurity states and Sn-induced band mixing in determining the nature of the indirect- to direct-gap transition in Ge1-xCx and Ge1-xSnx. For exemplar calculations on 64-atom Ge63(C,Sn) (x=1.56%) supercells we derive and parametrise model Hamiltonians which provide quantitative and physically transparent descriptions of these localisation and band mixing mechanisms, and comment on the implications of the Ge1-x(C2Sn)x alloy band structure for technologically relevant material properties.
机译:我们对IV族合金Ge的电子结构进行了理论分析 1-x (C,Sn) x 。我们的分析基于通过混合密度泛函理论计算参数化的半经验紧密绑定模型。使用原子合金超晶胞计算,我们确定并量化了C相关的局部杂质态和Sn诱导的能带混合在确定Ge的间接间隙到直接间隙转变的性质中所起的作用 1-x C x 和葛 1-x x 。用于64原子Ge的示例性计算 63 我们推导的(C,Sn)(x = 1.56%)超细胞和参数化模型哈密顿量,它们提供了这些定位和谱带混合机制的定量和物理透明描述,并评论了Ge的含义 1-x (C 2 锡) x 合金带状结构,可提供与技术相关的材料性能。

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