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Development of a Source-Exposure Matrix for Occupational Exposure Assessment of Electromagnetic Fields in the INTEROCC Study

机译:在INTEROCC研究中开发用于电磁场职业暴露评估的源暴露矩阵

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Introduction: As part of the INTEROCC study, we collected information on work with sources of exposure to electric and magnetic fields (EMF) by using a detailed source-based questionnaire, covering the entire EMF frequency range (from 0 Hz to 300 GHz). To estimate occupational exposure of study subjects to the EMF sources identified, we constructed a database of source-based measurements from published and unpublished literature. The aim of the current work was to summarize these measurements into a source-exposure matrix (SEM), accounting for their quality and relevance. Methods: We developed methods for combining available measurements based on the assumptions of log-normality and symmetric quantiles of EMF data. Pooled estimates were weighted by our confidence in the combined measurement data. Arithmetic and geometric means, as well as estimates of variability and maximum exposure were calculated by EMF source, frequency band and dosimetry type. Results: The SEM contains confidence-weighted exposure estimates for the electric (E-field) and magnetic (H- and B-field) fields for 312 EMF exposure sources. Operator position geometric mean electric field levels for RF sources ranged between 0.8 V/m (plasma etcher) and 320 V/m (RF sealer), while magnetic fields ranged from 0.02 A/m (speed radar) to 0.6 A/m (microwave heating). For ELF sources, electric fields ranged between 0.2 V/m (electric forklift) and 11,700 V/m (HVTL-hotsticks), while magnetic fields ranged between 0.14 μT (visual display terminals) and 17 μT (TIG welding). Conclusion: The methodology developed allowed the construction of an EMF-SEM from measurements collected from the literature and may be used to summarize similar exposure data for other physical or chemical agents. The SEM will be used together with detailed information on distance to the source, automation, and other determinants of exposure reported by the study subjects, to calculate indices of cumulative exposure to EMF for their use in the analysis of brain tumours risk associated with these exposures. The SEM will also be offered publicly for its use by other researchers.
机译:简介:作为INTEROCC研究的一部分,我们使用了详细的基于来源的问卷调查,收集了有关暴露于电场和磁场(EMF)的工作信息,涵盖了整个EMF频率范围(从0 Hz到300 GHz)。为了估计研究对象对确定的EMF来源的职业暴露程度,我们构建了一个基于已发布和未发布文献的基于源度量的数据库。当前工作的目的是将这些度量汇总到一个源暴露矩阵(SEM)中,以说明其质量和相关性。方法:我们开发了基于对数正态和EMF数据对称分位数的假设来组合可用度量的方法。合并的估计值由我们对合并测量数据的信心加权。算术和几何方法,以及对变异性和最大暴露量的估算是通过EMF来源,频带和剂量法类型计算的。结果:SEM包含312个EMF曝光源的电场(电场)和磁场(H场和B场)的置信度加权曝光估计。射频源的操作员位置几何平均电场强度范围为0.8 V / m(等离子刻蚀机)至320 V / m(RF封口机),而磁场范围为0.02 A / m(速度雷达)至0.6 A / m(微波)加热)。对于ELF源,电场的范围介于0.2 V / m(电动叉车)和11,700 V / m(HVTL热压棒)之间,而磁场的范围介于0.14μT(可视显示终端)和17μT(TIG焊接)之间。结论:所开发的方法允许根据文献收集的测量结果构建EMF-SEM,并可用于总结其他物理或化学试剂的相似暴露数据。 SEM将与研究对象报告的距放射源的距离,自动化以及其他决定因素的详细信息一起使用,以计算累积的EMF暴露指数,以用于分析与这些暴露相关的脑瘤风险。 SEM也将公开提供,供其他研究人员使用。

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