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HCD-Induced GIDL Increase and Circuit Implications

机译:HCD诱导的GIDL增加和电路影响

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摘要

In this paper we review the physics of gate-induced drain leakage (GIDL) increase due to hot carrier degradation (HCD) and the proposed modelling for reliability simulations. A case study of an analog circuit where this phenomenon leads to an overall increase of static power consumption over time is shown. This is attributed to the GIDL current being the major component of the leakage current of the circuit in off-mode. Finally, we propose some mitigation techniques by using alternative devices including high-K metal gate (HKMG) devices, where the GIDL current does not show uniform behavior post HCD.
机译:本文审查了由于热载体降解(HCD)和可靠性模拟的提出建模,介绍栅极诱导的漏极泄漏(GID1)的物理学。显示了这种现象导致静态功耗随时间的总体增加的模拟电路的案例研究。这归因于GIDL电流是电路漏电电流的主要分量。最后,我们通过使用包括高k金属栅极(HKMG)器件的替代装置提出一些缓解技术,其中GID1电流不显示HCD后的均匀行为。

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