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Fast inscription of Bragg grating arrays in undoped PMMA mPOF

机译:未掺杂的PMMA mPOF中的Bragg光栅阵列的快速标记

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In this work, the inscription in few seconds of a Bragg grating array in undoped PMMA mPOF using the phase mask technique is reported. The fast growth was possible through the use of a 248 nm UV laser, with suited laser parameters, allowing the creation of a core refractive index modulation without damaging the fiber surface. The Bragg gratings were written in the IR region presenting good spectral properties, achieving for the best case 30 dB reflectivity and 0.2 nm bandwidth. The Bragg grating array was characterized to strain and results are in agreement with the values reported in literature.
机译:在这项工作中,报道了使用相位掩膜技术在数秒之内用无掺杂的PMMA mPOF制作的Bragg光栅阵列的铭文。通过使用具有合适激光参数的248 nm UV激光器,可以实现快速生长,从而可以在不损坏光纤表面的情况下创建纤芯折射率调制。布拉格光栅写在红外区,具有良好的光谱特性,在最佳情况下可实现30 dB的反射率和0.2 nm的带宽。布拉格光栅阵列具有应变特性,其结果与文献报道的值一致。

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