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Injection/bunching section design of a Sub-millimetric klystron

机译:亚毫米速调管的注入/聚集段设计

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The design of the injection and bunching section for a Sub-millimetric klystron is described in this paper. A Carbon nanotube cold cathode is employed to produce the required beam current. An opportune shape of the device has been chosen to allow for the micro-fabrication, while ensuring the correct Buncher excitation. In this range of critical dimensions, multiple physics influencing factors, due to the heating effects and power dissipations over the beam dynamics, may alter the desired behavior of the device. A multiphysics design approach has been employed to ensure the future correct operation selecting appropriate materials and shapes. Several strategies have been adopted to obtain a simple but reliable model.
机译:本文介绍了次毫米速调管注入和成束段的设计。碳纳米管冷阴极用于产生所需的电子束电流。选择了合适的设备形状以允许微制造,同时确保正确的Buncher激发。在此临界尺寸范围内,由于光束动力学上的热效应和功率耗散,多种物理影响因素可能会改变设备的预期性能。已采用多物理场设计方法来确保将来选择合适的材料和形状时进行正确的操作。已经采用了几种策略来获得简单但可靠的模型。

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